Consider the cooling arrangement for the very large-scale integration (VLSI) chip of Problem 4.75. Use the finite-element

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Consider the cooling arrangement for the very large-scale integration (VLSI) chip of Problem 4.75. Use the finite-element method of FEHT to obtain the following results.

(a) Determine the temperature distribution in the chip-substrate system. Will the maximum temperature exceed 85°C?

(b) Using the FEHT model developed for part (a), determine the volumetric heating rate that yields a maximum temperature of 85°C.

(c) What effect would reducing the substrate thickness have on the maximum operating temperature? For a volumetric generation rate of q = 107 W/m3 reduce the thickness of the substrate from 12 mm to 6 mm, keeping all other dimensions unchanged. What is the maximum system temperature for these conditions? What fraction of the chip power generation is removed by convection directly from the chip surface?

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Fundamentals of Heat and Mass Transfer

ISBN: 978-0471457282

6th Edition

Authors: Incropera, Dewitt, Bergman, Lavine

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