A plasma etcher has a yield of good chips that is influenced by pressure (X1) and gas
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A plasma etcher has a yield of good chips that is influenced by pressure (X1) and gas flow rate X2). Both X1 and X2 arc scaled variables (0 ? Xi ? 2). A model has been developed based on operating data as follows:Use Excel to maximize yield Y, using starting points of (1,1) and (0,0).
Transcribed Image Text:
Y = -0.1x+ 0.2X2X - 0.09X -- 0.11X{ + 0.15X; + 0.5
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Related Book For
Process Dynamics And Control
ISBN: 978-0471000778
2nd Edition
Authors: Dale E. Seborg, Thomas F. Edgar, Duncan A. Mellich
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