Question: A plasma etcher has a yield of good chips that is influenced by pressure (X1) and gas flow rate X2). Both X1 and X2 arc
A plasma etcher has a yield of good chips that is influenced by pressure (X1) and gas flow rate X2). Both X1 and X2 arc scaled variables (0 ? Xi ? 2). A model has been developed based on operating data as follows:
Use Excel to maximize yield Y, using starting points of (1,1) and (0,0).
Y = -0.1x+ 0.2X2X - 0.09X -- 0.11X{ + 0.15X; + 0.5
Step by Step Solution
3.29 Rating (170 Votes )
There are 3 Steps involved in it
By using ExcelSolver this optimization problem is quickl... View full answer
Get step-by-step solutions from verified subject matter experts
Document Format (1 attachment)
38-E-C-E-P-C (313).docx
120 KBs Word File
