Consider an unreplicated 2 k factorial, and suppose that one of the treatment combinations is missing. One
Question:
Example 14-5
An article in Solid State Technology [Orthogonal Design for Process Optimization and Its Application in Plasma Etching (May 1987, pp. 127132)] describes the application of factorial designs in developing a nitride etch process on a single-wafer plasma etcher. The process uses C2F6 as the reactant gas. It is possible to vary the gas flow, the power applied to the cathode, the pressure in the reactor chamber, and the spacing between the anode and the cathode (gap). Several response variables would usually be of interest in this process, but in this example, we concentrate on etch rate for silicon nitride. We use a single replicate of a 24 design to investigate this process. Because it is unlikely that the three- and fourfactor interactions are significant, we tentatively plan to combine them as an estimate of error. The factor levels used in the design follow:
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Applied Statistics And Probability For Engineers
ISBN: 9781118539712
6th Edition
Authors: Douglas C. Montgomery, George C. Runger