Consider the data in Exercise 15-20. Set up a CUSUM scheme for this process assuming that μ = 16 is the process target. Explain how you determined your estimate of σ and the CUSUM parameters K and H.

Exercise 15-20

In a semiconductor manufacturing process, CVD metal thickness was measured on 30 wafers obtained over approximately two weeks. Data are shown in the following table.

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Wafer Wafer 16 1 16.8 15.4 2 14.9 17 14.3 3 18.3 18 16.1 4. 16.5 19 15.8 17.1 20 15.9 15.2 17.4 21 15.9 22 16.7 8. 14.4 23 15.2 9. 15.0 24 14.7 10 15.7 25 17.9 17.1 11 26 14.8 15.9 12 27 17.0 13 16.4 28 16.2 14 15.8 29 15.6 15 15.4 30 16.3