Photolithography plays a central role in manufacturing integrated circuits made on thin disks of silicon. Prior to a quality-improvement program, too many rework operations were required. In a sample of 200 units, 26 required reworking of the photolithographic step. Following training in the use of Pareto charts and other approaches to identify significant problems, improvements were made. A new sample of size 200 had only 12 that needed rework. Is this sufficient evidence to conclude at the 0.01 level of significance that the improvements have been effective in reducing the rework?