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2. Consider Sit]: deposited by reacting silane and oxygen at 45D C. The deposition rate is III]I nth-min and the activation energy is [3.43 eV.
2. Consider Sit]: deposited by reacting silane and oxygen at 45D\" C. The deposition rate is III]I nth-"min and the activation energy is [3.43 eV. By how much should one increase the temperature to double the deposition rate\":1
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