2. During electrodeposition of copper, the reaction at the cathode is as follows: Cut- + 2e - Cu(0) 1.e., one copper atom is deposited for every 2 electrons of the current. Cu(0) represents the deposited copper film. Calculate the thickness of the copper film that will be deposited on a substrate whose area is 314 cm- (8 inch wafer), if the current is 0.05 amps and the deposition time is 10 minutes. Mass of Cu atom = 1.055 x 10"-- g Density of Cu = 8.9 g/cm3