2. Thin film interference You are requested to design a high reflectivity mirror using the multilayer coating technique to reflect light waves illuminating in the normal direction. Your fabrication tool only allows you to deposit two different kinds of dielectric materials, one is silicon dioxide with a refractive index of 1.5, and the other is silicon nitride with a refractive index of 2. The following schematic shows the thin film structure you plan to coat on top of your glass substrate. What is the thickness of the alternative silicon dioxide (to) and silicon nitride (tn) layers you should coat? (5 pts) A=1um