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3. El gas tetraclorosilano (SiCl4) altamente purificado se hace reaccionar con gas hidrgeno (H2) para producir silicio policristalino de grado electrnico a 800 C y

3. El gas tetraclorosilano (SiCl4) altamente purificado se hace reaccionar con gas hidrgeno (H2) para producir silicio policristalino de grado electrnico a 800 C y 1,5 105 de acuerdo con la ecuacin: 4()+22()() +4 () Existe la preocupacin de que la reaccin experimente limitaciones de difusin en la superficie slida de Si en crecimiento. Estime el coeficiente de difusin molecular para (a) SiCl4 en H2 y (b) SiCl4 en una mezcla en fase gaseosa que contiene 40 % mol de SiCl4, 40 % mol de H2 y 20 % mol de HCl. Los parmetros de Lennard-Jones para SiCl4 (especie A) son = 358 , = 5,08

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