A chemical species A was used to grow films of chemical species deposition (CVD). The deposition rate as a function of the pressur

Growth rate (-rD) (um/h)

0.095

0.1

PA (torr)

0.1

0.2

0.3

0.5

0.8

1

1.5

2.0

The suggested mechanism is as follows:

2A # X

X+S+ XS

XS - B+ S

a.

If the process is surface reaction limited, derive the rate law.

b.

Evaluate the rate law parameters.

A chemical species A was were The suggested mechanism is as follows: 2AXX+SXSXSB+S a. If the process is surface reaction limited, derive the rate law. b. Evaluate the rate law parameters