A chemical species A was used to grow films of chemical species B via chemical vapor deposition (CVD). The deposition rate as a function of the pressure of A is as shown below:

Growth rate (-rD) (um/h)

0.004

0.015

0.025

0.04

0.068

0.08

0.095

0.1

PA

(torr)

0.1

0.2

0.3

0.5

0.8

1

1.5

2.0

The suggested mechanism is as follows:

2A X

x+SAXS

XS - B + S

a.

If the process is surface reaction limited, derive the rate law. b.

Evaluate the rate law parameter

A chemical species A was used to grow films of chemical species B via chemical vapor deposition (CVD). The deposition rate as a function of the pressure of A is as shown below: The suggested mechanism is as follows: 2AXX+SXSXSB+S a. If the process is surface reaction limited, derive the rate law. b. Evaluate the rate law parameters