a) What is the minimum feature size achievable using proximity lithography with a 1 m gap in conjunction with a k = 0.8 photoresist and a 248 nm light source? Answer in [m].

b) Does the scenario above satisfy the Frensel limit?

c) Using the same laser and resist, what is the minimum gap size required for proximity lithography to have better resolution than a projection lithography system using water immersion optics (NA = 1.4)? Answer in [m].