Elaborate on a part that is faltered all in all wafer. 2. enumerate the events that result in the formation of N-wells. 3. enumerate the best CMOS circuit forms. 4. How will the concentration and depth of P-well doping affect the? 5. Give more details about the procedure for removing a few pieces of the photoresist layer 6. In CMOS manufacture, the photoresist layer is presented to? 7. shed light on the role that a light-sensitive polymer plays in the formation of photoresist layers 8. Which component is utilized during the oxidation process? 9. In what way is the P-well connected to the n substrate? 10. Give a reason why; nMOS and pMOS are integrated into the same substrate during CMOS fabrication.