For the following data set of measurements on the resistivity of 24 silicon wafers after an epitaxial layer has been deposited in a single wafer deposition process. calculate the appropriate measure of centrality and variability and explain why these metrics were selected. 216 290 236 228 447 210 139 310 240 211 175 419 307 367 168 360 226 253 380 131 173 224 195 398 (12 Marks)