The following figure shows the deposition rate of CVD as related to the process temperature. It is divided into two regions (A&B) according to the rate-limiting factor. Which region (A&B) is limited by what factor? What is the effect of temperature and gas flow rate? TEMPERATURE (C) 1300 1200 1100 1000 900 1.0T GROWTH RATE (m/min) 80 02 05 B - 0.2 -000 0.5- A 800 700 600 OSiH4 SIH2Cl2 ASIHC!3 Osicl4 .01 0.7 0.8 0.9 1.0 1.1 10/T(K)