ou need to electroplate copper onto a 200-mm-diameter wafer. To get a good quality electrodeposit, you find you need to plate with a current density of 30 mA/cm2 . 5-1. How much current should the power supply deliver? 5-2. How long will it take to deposit 1 μm? Often the wafer is covered with photoresist everywhere except for openings where the electrodeposit is selectively plated. If the percentage of open area through the resist to be plated upon is only 1% of the total wafer surface, answer the same questions: 5-3. How much current should the power supply deliver? 5-4. How long will it take to plate 1 μm?