Question: Particle deposition rate J on a wafer that is parallel to airflow is given by J= nu, where n is the particle density and

Particle deposition rate J on a wafer that is parallel to airflow

Particle deposition rate J on a wafer that is parallel to airflow is given by J= nu, where n is the particle density and u is the sum of gravitational and diffusive settling velocities, - 5 x 10-cm/s for 0.1 to 0.5um particles. How many particles will deposit on a 200mm wafer in an ISO class 2 cleanroom in an hour?

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