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Question 2.6 The following microstructure on a silicon wafer is to be deposited with 0.5m-thick polysilican through low-pressure chemical vapor deposition (LPCVD). Sketch (on the
Question 2.6 The following microstructure on a silicon wafer is to be deposited with 0.5m-thick polysilican through low-pressure chemical vapor deposition (LPCVD). Sketch (on the figure below) the film deposited. Assume that the PSG and the silicon nitride in the figure are 2m and 1m thick, respectively
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Fundamentals Of Momentum Heat And Mass Transfer
Authors: James Welty, Gregory L. Rorrer, David G. Foster
7th Edition
111972354X, 978-1119723547
