What is the ratio of B and P atoms implanted into Si with the same 200 keV energy at 0.4 m depth? Use Fig. below

What is the ratio of B and P atoms implanted into Si with the same 200 keV energy at 0.4 µm depth? Use Fig. below and your calculations of the implantation profiles.

 

range (um) 0.1 0.01 10 boron -phosphorus -antimony --arsenic 100 implant energy (keV) (a) B Sb 1000 straggle (um) 0.1 0.01 0.001 10 B 18 Sb -boron -phosphorus -- antimony ..arsenic 100 implant energy (keV) (b) 1000 range (um) 0.1 0.01 10 boron -phosphorus -antimony --arsenic 100 implant energy (keV) (a) B Sb 1000 straggle (um) 0.1 0.01 0.001 10 B 18 Sb -boron -phosphorus -- antimony ..arsenic 100 implant energy (keV) (b) 1000