Your research project requires the deposition of a compact thin films using CVD. The mass transfer coefficient h_g of your setup amounts to 3.1 mm/s, whereas the surface reaction rate coefficient

k_s = 2.3 10⁷ exp(-0.93 eV/k_BT) (in cm/s).

(a) For a deposition at 500 C, would you use a cold-walled system or a hot-walled system? Please show all calculations and explain your answer.

(b) Would you place your substrates flat on a tilted susceptor or stack them vertically with respect to the gas flow? Explain your answer.

QUESTION 4 (15 marks): Your research project requires the deposition of a compact thin films using CVD. The mass transfer coefficient hg of your setup amounts to 3.1 mm/s, whereas the surface reaction rate coefficient ks = 2.3 10 exp(-0.93 eV/kgT) (in cm/s). (a) For a deposition at 500 C, would you use a cold-walled system or a hot-walled system? Please show all calculations and explain your answer. (b) Would you place your substrates flat on a tilted susceptor or stack them vertically with respect to the gas flow? Explain your