Question: The standard deviation of critical dimension thickness in semiconductor manufacturing is = 20 nm. (a) State the null and alternative hypotheses used to demonstrate
The standard deviation of critical dimension thickness in semiconductor manufacturing is σ = 20 nm.
(a) State the null and alternative hypotheses used to demonstrate that the standard deviation is reduced.
(b) Assume that the previous test does not reject the null hypothesis. Does this result provide strong evidence that the standard deviation has not been reduced? Explain.
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a b This result does not provide strong evidenc... View full answer
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