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A spin coater is used to apply photoresist to a bare silicon wafer. This operation usually occurs early in the semiconductor manufacturing process, and the

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A spin coater is used to apply photoresist to a bare silicon wafer. This operation usually occurs early in the semiconductor manufacturing process, and the average coating thickness and the variability in the coating thickness have an important impact on downstream manufacturing steps. Six variables are used in the experiment. The variables and their high and low levels are as follows: The experimenter decides to conduct an experiment and to make three replications to measure the resist thickness on each test wafer. The 2. Using the full-model, determine the change in resist thickness if the 'Cover' is changed from 'Off' to 'On'. Round your answer to 2 decimal places. 3. Using the full-model, determine the effect of the most significant 2-way interaction term. Round your answer to 2 decimal places. 4. Using the full-model, determine the mean of the residual. Round your answer to 2 decimal places

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