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A tunnel diode is formed using highly doped silicon with a total depletion width under equilibrium conditions of 5 nm. According to the depletion approximation,
A tunnel diode is formed using highly doped silicon with a total depletion width under equilibrium conditions of 5 nm. According to the depletion approximation, what doping level would be needed to achieve this? Assume equal doping levels on both sides of the junction
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