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An experiment was conducted in a low-pressure vapor deposition of polysilicon to investigate the effect of wafer position on film thickness uniformity. Wafer positions in
An experiment was conducted in a low-pressure vapor deposition of polysilicon to investigate the effect of wafer position on film thickness uniformity. Wafer positions in the reactor were randomly selected. Three replicates of the experiment were run. The data are presented in the table below. (a) State the hypothesis
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Discrete and Combinatorial Mathematics An Applied Introduction
Authors: Ralph P. Grimaldi
5th edition
201726343, 978-0201726343
