An experiment was run in a semiconductor fabrication plant in an effort to increase the number of good chips produced per wafer. Five factors, each at two levels, were studied. The factors (and levels) were A = aperture setting (small, large), B = exposure time (20% below nominal), C = development time (30 sec, 45 sec), D = mask dimension (small, large), and E = etch time (14.5min, 15.5min). Set up a design in four blocks of eight runs each, with ACDE and BCE confounded with blocks. What is the other confounded effect? Analyze the data and draw conclusions.

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