Question
For 100-KeV implantation of As ions (doubly ionized As) into Si (100) at a current of 10 mA (10 -3 A) over an area of
For 100-KeV implantation of As ions (doubly ionized As) into Si (100) at a current of 10 mA (10-3 A) over an area of a 12-inch wafer for 10 min .Calculate the damage per ion and per unit area (cm2)?
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Implantation of Arsenic Ions into Silicon Lets calculate the damage caused by implanting Arsenic As ...
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Income Tax Fundamentals 2013
Authors: Gerald E. Whittenburg, Martha Altus Buller, Steven L Gill
31st Edition
1111972516, 978-1285586618, 1285586611, 978-1285613109, 978-1111972516
