Magnesium atoms will be dispersed in the silicon plate by using pre-deposition and impregnation heat treatments. The Mg content of the silicon structure is known as 2x10^19 atoms/m3. The pre-deposition process will be carried out at 950C for 50 minutes and the Mg concentration on the surface will be constant at 1x10^26 atom/m3 levels. Indoor broadcasting will be carried out at 1100C for 3 hours. In the diffusion of Mg in Si, the Qy and D0 values are 2.4 eV/atom and 1.5x10^-5 m2/s, respectively. In this situation;

a) Calculate the value of Q0.

b) Determine the value of xj in broadcasting inside.

c) Calculate the depth at which the Mg atom concentration is 10^24 m-3 in the interior diffusion process.