Plasma Physics Question

The dominant ion in low pressure plasmas operated in a mixture of argon and hydrogen is the ArH+ion. This is produced via H+through the reaction: Ar+H+ArH+ For the deposition of amorphous silicon, SiH4 is added to the argon / hydrogen plasma described above. The SiH3 radical can be formed in two steps: first, charge exchange and second, dissociative recombination. Give an example of a combination of charge exchange reaction and dissociative recombination reaction leading to the production of a SiH3 radical