Six samples with Individual observations have been collected on the oxide thickness of silicon wafers. as shown In the following table. Atwo-sided tabular Cusurn control chart is to be constructed for the data using a 40% headstart to detect a shift of 10. Assume the target thickness is 60. h = 4. and the standard deviation is 5. it can be concluded from the data that there is no evidence of a shift that is greater than: 0 a. 0.100 o b. 0.50:! o c. 1.000 Q d. 0.300 o e. 0.250