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Thin Film Technology Develop a system to deposit an alternate composite of titanium nitride, TiN: Titanium nitride / TiC: Titanium carbide, TiC on a grinding

Thin Film Technology
Develop a system to deposit an alternate composite of titanium nitride, TiN: Titanium nitride/ TiC: Titanium carbide, TiC on a grinding tool (its melting point is 1550C and softening temperature is 940C) with a complex shape and cavities. Thickness of each layer should be 1200A(120nm), and three layer of each compound is requested.
a. What technique do you recommend to deposit this coating?
b. Explain details of the process, write all reactions.
c. What characterization techniques do you use to monitor and control the process, elemental distribution, thickness of each layer, and chemical composition of each layer?
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