(a) Calculate the band bending depth d for a pn junction in the semiconductor GaAs, with doping...
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(a) Calculate the band bending depth d for a p–n junction in the semiconductor GaAs, with doping concentration n = 1016 cm−3 and dielectric constant ϵ = 14ϵ0, using (2.6.6).
(b) Suppose that instead of having equal doping concentrations, the p-type side is doped at concentation n = 5 × 1016 cm−3 and the n-type is doped at n = 1016 cm−3. How does this change the junction?
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