A plasma etching batch process has a process gain of E A/min (but no dynamics). The manipulated
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A plasma etching batch process has a process gain of E Ȧ/min (but no dynamics). The manipulated variable is the etch time, so the controlled variable is the film thickness. There are no time constants that need to be included. Assume Gv = Gm = 1. Derive the closed-loop transfer function for a set-point change for two different controllers:
(a) Gc = Kc
(b) Gc = 1 / τIs
In both cases, analyze the effect of a unit step set-point change. Sketch the response and show whether there is offset or not.
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Related Book For
Process Dynamics and Control
ISBN: 978-1119385561
4th edition
Authors: Dale E. Seborg, Thomas F. Edgar, Duncan A. Mellichamp, Francis J. Doyle
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