1) An experiment analyzes imperfection rates for two processes used to fabricate silicon wafers for computer chips. For treatment A applied to 10 wafers, the number of imperfections is 8, 7, 6, 6, 3, 4, 7, 2, 3, 4. Treatment B applied to 10 other wafers has 9, 9, 8, l4, 8, 13, 11, 5, 7, 6 imperfections. Treat the counts as independent Poisson variates having means HA and :43. i) Fit a model of the form log(u) = or + Bx, where x = 0 for treatment A and x = 1 for treatment B. ii) Show that B = log(uprA) and interpret your estimate of [3 obtained in part (i) above. iii) Test HO: pA = uB against two sided alternative H1: uA 72 uB using Wald test. iv) Construct a Wald type 95% condence interval for pB/uA