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el silicio se graba en plasma segn la reaccin Si(s) + 2Cl2(g) >SiCl4(g). Cul es la tasa de grabado mxima terica de una oblea de

el silicio se graba en plasma segn la reaccin Si(s) + 2Cl2(g) >SiCl4(g). Cul es la tasa de grabado mxima terica de una oblea de silicio de 200 mm de dimetro cuando el flujo de cloro es de 100 sccm (centmetros cbicos estndar por minuto)?

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